JPH0217019Y2 - - Google Patents
Info
- Publication number
- JPH0217019Y2 JPH0217019Y2 JP2797985U JP2797985U JPH0217019Y2 JP H0217019 Y2 JPH0217019 Y2 JP H0217019Y2 JP 2797985 U JP2797985 U JP 2797985U JP 2797985 U JP2797985 U JP 2797985U JP H0217019 Y2 JPH0217019 Y2 JP H0217019Y2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- packing
- reaction tube
- reaction
- phase growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012856 packing Methods 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 31
- 239000012495 reaction gas Substances 0.000 claims description 19
- 238000001947 vapour-phase growth Methods 0.000 claims description 19
- 239000007788 liquid Substances 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 8
- 238000002425 crystallisation Methods 0.000 claims description 5
- 230000008025 crystallization Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 description 11
- 238000001816 cooling Methods 0.000 description 10
- 239000002244 precipitate Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2797985U JPH0217019Y2 (en]) | 1985-02-26 | 1985-02-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2797985U JPH0217019Y2 (en]) | 1985-02-26 | 1985-02-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61142876U JPS61142876U (en]) | 1986-09-03 |
| JPH0217019Y2 true JPH0217019Y2 (en]) | 1990-05-11 |
Family
ID=30525431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2797985U Expired JPH0217019Y2 (en]) | 1985-02-26 | 1985-02-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0217019Y2 (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0638113Y2 (ja) * | 1988-02-08 | 1994-10-05 | 国際電気株式会社 | 縦形炉におけるｏリングシール部の冷却構造 |
| JP2641593B2 (ja) * | 1990-04-12 | 1997-08-13 | 松下電子工業株式会社 | 薄膜形成装置 |
-
1985
- 1985-02-26 JP JP2797985U patent/JPH0217019Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61142876U (en]) | 1986-09-03 |
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